The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2019
Filed:
May. 02, 2017
Hangzhou Dianzi University, Hangzhou, CN;
Zhihua Dong, Hangzhou, CN;
Zhiqun Cheng, Hangzhou, CN;
Guohua Liu, Hangzhou, CN;
Huajie Ke, Hangzhou, CN;
Hangzhou Dianzi University, Hangzhou, CN;
Abstract
Disclosed is a novel III-V heterojunction field effect transistor comprising a substrate layer, a first semiconductor layer, a second semiconductor layer, a drain electrode, a source electrode, a gate electrode, a first dielectric layer, second dielectric layers and the like, wherein the first semiconductor layer has a greater bandgap compared with the second semiconductor layer, and the second semiconductor layer and the first semiconductor layer are combined to form a heterostructure. The thickness of the first semiconductor layer is not greater than the critical thickness of two-dimensional electron gas formed in a heterojunction channel, and thus natural 2DEG in the heterojunction channel is depleted. The novel III-V heterojunction field effect transistor has the advantages of being simple in structure, simple in preparation process, stable in performance, high in reliability and the like.