The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2019
Filed:
Aug. 01, 2017
Applicant:
Nuflare Technology, Inc., Yokohama-shi, JP;
Inventors:
Hiroshi Yamashita, Sagamihara, JP;
Munehiro Ogasawara, Hiratsuka, JP;
Assignee:
NuFlare Technology, Inc., Yokohama-shi, JP;
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/244 (2006.01); H01J 37/30 (2006.01); H01J 37/317 (2006.01); H01J 37/153 (2006.01);
U.S. Cl.
CPC ...
H01J 37/244 (2013.01); H01J 37/3007 (2013.01); H01J 37/3177 (2013.01); H01J 37/153 (2013.01); H01J 37/3174 (2013.01);
Abstract
In one embodiment, an aperture for inspecting a multi-beam allows passage of one beam among multi-beams applied in a multi-beam writing apparatus. The aperture includes a scattering layer that is provided with a through-hole through which the one beam passes, and by which the other beams are scattered, and an absorbing layer that is provided with an opening having a diameter greater than the diameter of the through-hole and that absorbs at least some of the beams entering it.