The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2019
Filed:
Jun. 17, 2016
Asml Netherlands B.v., Veldhoven, NL;
Asml Holding N.v., Veldhoven, NL;
Laurentius Johannes Adrianus Van Bokhoven, Veldhoven, NL;
Christopher Charles Ward, Kensington, CA (US);
Marc Léon Van Der Gaag, Rheden, NL;
Johan Gertrudis Cornelis Kunnen, Weert, NL;
ASML Netherlands B.V., Veldhoven, NL;
ASML Holding N.V., Veldhoven, NL;
Abstract
A lithographic apparatus () includes a patterning device support structure () configured to support a patterning device (), a gas inlet () configured to provide a gas flow () across a surface of the patterning device, and a temperature conditioning device () configured to condition the temperature of the gas flow based on a set point. The apparatus also includes a sensor () configured to measure a parameter indicative of an amount of heat added to at least one of the patterning device and a volume () between the patterning device and a lens () of a projection system () during operational use of the lithographic system. Further, the apparatus includes a controller () operatively coupled to the sensor and configured to adjust the set point based on the parameter measured by the sensor to control a temperature of the patterning device.