The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 30, 2019
Filed:
Aug. 24, 2017
Applied Materials Israel Ltd., Rehovot OT, IL;
Karen Pomeranz, Hod Hasharon, IL;
Eyal Neistein, Herzliya, IL;
Vivek Balasubramanian, Portland, OR (US);
Moshe Amzaleg, Beer Sheva, IL;
Eyal Bassa, Matan, IL;
APPLIED MATERIALS ISRAEL LTD., Rehovot, IL;
Abstract
There are provided system and method of detecting repeating defects on a specimen, the specimen obtained by printing two or more mask fields thereon, each of mask field comprising multiple dies, the method comprising: scanning the specimen to capture a plurality of first images from first dies located at the same position in the mask fields, and, for each first image, capture two or more second images from dies located in different positions from the first dies; generating a plurality of third images corresponding to the plurality of first images; generating, an average third image constituted by pixels with values computed as accumulated pixel values of corresponding pixels in the plurality of third images divided by the number of the two or more mask fields; and determining presence of repeating defects on the specimen based on the average third image and a predefined defect threshold.