The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 23, 2019

Filed:

Mar. 27, 2017
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Hsin-Hsiang Tseng, Changhua County, TW;

Chih-Fei Lee, Tainan, TW;

Chia-Pin Cheng, Kaohsiung, TW;

Fu-Cheng Chang, Tainan, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/0216 (2014.01); H01L 31/0232 (2014.01); H01L 27/146 (2006.01); H01L 31/112 (2006.01);
U.S. Cl.
CPC ...
H01L 31/02162 (2013.01); H01L 27/14643 (2013.01); H01L 27/14683 (2013.01); H01L 31/0232 (2013.01); H01L 31/1125 (2013.01); Y02E 10/50 (2013.01); Y02P 70/521 (2015.11);
Abstract

A semiconductor device is provided, which includes a substrate and at least one nanostructure. The substrate has sensing pixels, and each of the sensing pixels has a photo sensing region for absorbing incident light. The nanostructure is directly on the photo sensing region. The nanostructure of each of the sensing pixels has a projected portion on an upper surface of the substrate, and a circle equivalent diameter of the projected portion of the nanostructure of each of the sensing pixels is substantially within a wavelength range of 100 nm to 1900 nm of the incident light configured to enter the substrate through the nanostructure.


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