The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2019
Filed:
Feb. 19, 2013
Tokyo Electron Limited, Tokyo, JP;
Derek W. Bassett, Cedar Park, TX (US);
Wallace P. Printz, Austin, TX (US);
Joshua S. Hooge, Austin, TX (US);
Katsunori Ichino, Kumamoto, JP;
Yuichi Terashita, Koshi, JP;
Kousuke Yoshihara, Koshi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
Techniques disclosed herein provide an apparatus and method of spin coating that inhibits the formation of wind marks and other defects from turbulent fluid-flow, thereby enabling higher rotational velocities and decreased drying times, while maintaining film uniformity. Techniques disclosed herein include a fluid-flow member, such as a ring or cover, positioned or suspended above the surface of a wafer or other substrate. The fluid-flow member has a radial curvature that prevents wind marks during rotation of a wafer during a coating and spin drying process.