The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 16, 2019
Filed:
Sep. 29, 2015
Applicant:
Unity Semiconductor, Monbonnot-Saint-Martin, FR;
Inventors:
Mayeul Durand De Gevigney, Chambery, FR;
Philippe Gastaldo, Pontcharra, FR;
Assignee:
UNITY SEMICONDUCTOR, Montbonnot-Saint-Martin, FR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/24 (2006.01); G01N 21/95 (2006.01); G01N 21/88 (2006.01); G01M 11/00 (2006.01); G01B 9/02 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
G01B 11/2441 (2013.01); G01B 9/02034 (2013.01); G01M 11/331 (2013.01); G01N 21/8806 (2013.01); G01N 21/9501 (2013.01); G01N 21/9503 (2013.01); H01L 22/12 (2013.01); G01B 2210/56 (2013.01);
Abstract
An electronic wafer inspecting method includes:
Durand De Gevigney, Mayeul. (2019). Interferometric method and system using variable fringe spacing for inspecting transparent wafers for electronics, optics or optoelectronics (U.S. Patent No. 10260868). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10260868
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile