The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 2019
Filed:
Oct. 09, 2018
Applicant:
Gigaphoton Inc., Tochigi, JP;
Inventors:
Tsukasa Hori, Oyama, JP;
Yutaka Shiraishi, Oyama, JP;
Shinya Ikesaka, Oyama, JP;
Takanobu Ishihara, Oyama, JP;
Toshiro Umeki, Oyama, JP;
Assignee:
Gigaphoton Inc., Tochigi, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05G 2/00 (2006.01);
U.S. Cl.
CPC ...
H05G 2/006 (2013.01); H05G 2/005 (2013.01); H05G 2/008 (2013.01);
Abstract
A target supply device according to a first aspect of the present disclosure is configured to supply a metal target in a plasma generation region and may include a tank configured to house the metal target, a filter having been subjected to a dehydration process, the filter being configured to suppress passage of particles in the metal target housed in the tank, and a nozzle provided with a nozzle hole configured to eject the metal target that has passed through the filter.