The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 19, 2019
Filed:
Dec. 01, 2017
Applied Materials, Inc., Santa Clara, CA (US);
Mangesh Bangar, San Jose, CA (US);
Bruce E. Adams, Portland, OR (US);
Kelly E. Hollar, Sunnyvale, CA (US);
Abhilash J. Mayur, Salinas, CA (US);
Huixiong Dai, San Jose, CA (US);
Jaujiun Chen, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A calibration curve for a wafer comprising a layer on a substrate is determined. The calibration curve represents a local parameter change as a function of a treatment parameter associated with a wafer exposure to a light. The local parameter of the wafer is measured. An overlay error is determined based on the local parameter of the wafer. A treatment map is computed based on the calibration curve to correct the overlay error for the wafer. The treatment map represents the treatment parameter as a function of a location on the wafer.