The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 12, 2019
Filed:
Aug. 07, 2015
Kla—tencor Corporation, Milpitas, CA (US);
Vladimir Levinski, Migdal HaEmek, IL;
Daniel Kandel, Aseret, IL;
KLA—Tencor Corporation, Milpitas, CA (US);
Abstract
Target design methods, targets as well as scanner aberration methods and device design improvements are provided. Metrology targets may be designed by identifying at least two geometric elements in a specified device design, and designing corresponding at least two target cells of an overlay metrology target to have structures related to the at least two geometric elements. Non-printed filling elements may be added to target or device designs which exhibit large spaces (e.g., larger than twice the minimal design rule pitch) in order to avoid placement error and other inaccuracies. Scanner aberrations themselves may be measured using corresponding targets as well.