The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2019
Filed:
Dec. 12, 2017
Applicant:
Asml Netherlands B. V., Veldhoven, NL;
Inventors:
Koen Jacobus Johannes Maria Zaal, Eindhoven, NL;
Joost Jeroen Ottens, Veldhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70716 (2013.01); G03F 7/7085 (2013.01); G03F 7/70341 (2013.01); G03F 7/70725 (2013.01); G03F 7/70775 (2013.01); G03F 7/70783 (2013.01); G03F 7/70858 (2013.01); G03F 7/70875 (2013.01);
Abstract
A lithographic apparatus with a cover plate formed separately from a substrate table, the cover plate configured to be to a side of the substrate during exposure, the cover plate being removable from the substrate table and supported on the substrate table by a protrusion. The lithographic apparatus further includes a linear encoder system configured to measure at least translation of the substrate table, a part of the linear encoder system being on the substrate table and located outward of the cover plate.