The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 26, 2019

Filed:

Sep. 04, 2015
Applicant:

Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);

Inventors:

Aaron P. Webb, Austin, TX (US);

Timothy J. Miller, Ipswich, MA (US);

Tammy Jo Pride, Pflugerville, TX (US);

Christopher N. Grant, Dripping Springs, TX (US);

James D. Strassner, Austin, TX (US);

Charles T. Carlson, Cedar Park, TX (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/68 (2006.01); H01J 37/304 (2006.01); H01J 37/317 (2006.01); G06T 7/73 (2017.01); C23C 14/48 (2006.01); G06K 9/62 (2006.01); G06T 7/00 (2017.01); H01J 37/20 (2006.01); H01J 37/22 (2006.01);
U.S. Cl.
CPC ...
H01L 21/681 (2013.01); C23C 14/48 (2013.01); G06K 9/6202 (2013.01); G06T 7/001 (2013.01); G06T 7/74 (2017.01); H01J 37/20 (2013.01); H01J 37/22 (2013.01); H01J 37/3045 (2013.01); H01J 37/3171 (2013.01); G06T 2207/30148 (2013.01);
Abstract

An active substrate alignment system for an ion implanter, the system including a platen, a registration device adapted to selectively move a substrate engagement surface disposed adjacent the platen for limiting movement of a substrate disposed on the platen, a camera configured to capture an image of the substrate before the substrate is disposed on the platen, and a controller in communication with the camera and the registration device, the controller configured to command the registration device to move the substrate engagement surface based on the image to limit movement of the substrate in a predetermined manner.


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