The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 19, 2019
Filed:
Jan. 26, 2016
Asml Netherlands B.v., Veldhoven, NL;
Hans Butler, Best, NL;
Maurice Willem Jozef Etiënne Wijckmans, Eindhoven, NL;
Engelbertus Antonius Fransiscus Van Der Pasch, Oirschot, NL;
Christiaan Alexander Hoogendam, Westerhoven, NL;
Bernardus Antonius Johannes Luttikhuis, Nuenen, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus comprising: a positioning stage (WT); an isolation frame (); a projection system (PS), comprising a first frame (); a second frame (); a supporting frame () for supporting the positioning stage; a first vibration isolation system () and a second vibration isolation system (), wherein the supporting frame and the first frame are coupled via the first vibration isolation system; a stage position measurement system () to determine directly the position of a stage reference of an element of the positioning stage in one or more degrees of freedom with respect to an isolation frame reference of an element of the isolation frame; and wherein the first frame and the isolation frame are coupled via the second vibration isolation system.