The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 19, 2019
Filed:
Feb. 09, 2018
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Christoph Petri, Oberkochen, DE;
Daniel Runde, Oberkochen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
An illumination system for an EUV projection exposure apparatus is designed for shaping illumination radiation from at least a portion of received EUV radiation. The illumination radiation is directed into an illumination field in an exit plane of the illumination system during exposure operation. An EUV radiation source is arranged in a source module separate from the illumination system. The illumination system includes an alignment state determining system including an alignment detector configured to receive a portion of the EUV radiation emerging from the secondary radiation source and to generate therefrom an alignment detector signal representative of the alignment state.