The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 12, 2019
Filed:
Apr. 18, 2016
Applicants:
Asm Ip Holding B.v., Almere, NL;
Imec Vzw, Leuven, BE;
Inventors:
Jan Willem Maes, Wilrijk, BE;
Werner Knaepen, Leuven, BE;
Roel Gronheid, Huldenberg, BE;
Arjun Singh, Leuven, BE;
Assignees:
IMEC vzw, Leuven, BE;
ASM IP HOLDING B.V., Almere, NL;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/33 (2006.01); H01L 21/033 (2006.01); G03F 7/00 (2006.01); H01L 21/02 (2006.01); H01L 21/027 (2006.01); H01L 21/32 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0338 (2013.01); G03F 7/0002 (2013.01); H01L 21/0228 (2013.01); H01L 21/0273 (2013.01); H01L 21/02178 (2013.01); H01L 21/0332 (2013.01); H01L 21/0335 (2013.01); H01L 21/0337 (2013.01); H01L 21/32 (2013.01);
Abstract
A method for forming a film with an annealing step and a deposition step is disclosed. The method comprises an annealing step for inducing self-assembly or alignment within a polymer. The method also comprises a selective deposition step in order to enable selective deposition on a polymer.