The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 05, 2019

Filed:

Feb. 10, 2014
Applicant:

Dowa Metaltech Co., Ltd., Tokyo, JP;

Inventors:

Takashi Kimura, Tokyo, JP;

Toshiya Kamada, Tokyo, JP;

Weilin Gao, Tokyo, JP;

Fumiaki Sasaki, Tokyo, JP;

Akira Sugawara, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C22C 9/06 (2006.01); C22F 1/08 (2006.01); H01B 1/02 (2006.01);
U.S. Cl.
CPC ...
H01B 1/026 (2013.01); C22C 9/06 (2013.01); C22F 1/08 (2013.01);
Abstract

A copper alloy sheet material comprises (by mass %) from 2.50 to 4.00% in total of Ni and Co, from 0.50 to 2.00% of Co, from 0.70 to 1.50% of Si, from 0 to 0.50% of Fe, from 0 to 0.10% of Mg, from 0 to 0.50% of Sn, from 0 to 0.15% of Zn, from 0 to 0.07% of B, from 0 to 0.10% of P, from 0 to 0.10% of REM, from 0 to 0.01% in total of Cr, Zr, Hf, Nb and S, the balance Cu and unavoidable impurities. A number density of coarse secondary phase particles (particle diameter of 5 mm or more) is 10 per mmor less. A number density of fine secondary phase particles (particle diameter of from 5 to 10 nm) is 1.0·10per mmor more. A Si concentration in the parent phase is 0.10% by mass or more.


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