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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10191376 B1

PDFFull Text
Date of Patent:
Jan. 29, 2019

Filed:

Dec. 22, 2014

Cross scan proximity correction with ebeam universal cutter

Applicant:

Intel Corporation, Santa Clara, CA (US);

Inventor:

Yan A. Borodovsky, Portland, OR (US);

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:

Schwabe, Williamson & Wyatt, P.C.

Primary Examiner:

Nicole Ippolito

Int. Cl.
CPC ...
G03F 7/20 (2006.01); H01L 21/68 (2006.01); H01L 21/027 (2006.01); H01L 21/033 (2006.01); H01L 21/308 (2006.01); H01L 21/311 (2006.01); H01L 21/3213 (2006.01); H01J 37/317 (2006.01); H01L 21/768 (2006.01); H01J 37/04 (2006.01); H01J 37/302 (2006.01);
U.S. Cl.
CPC ...
G03F 7/2037 (2013.01); H01J 37/045 (2013.01); H01J 37/3026 (2013.01); H01J 37/3177 (2013.01); H01L 21/0277 (2013.01); H01L 21/0337 (2013.01); H01L 21/308 (2013.01); H01L 21/31144 (2013.01); H01L 21/32139 (2013.01); H01L 21/76816 (2013.01); H01J 2237/0435 (2013.01); H01J 2237/0453 (2013.01); H01J 2237/303 (2013.01); H01J 2237/30422 (2013.01); H01J 2237/30438 (2013.01); H01J 2237/31762 (2013.01); H01J 2237/31764 (2013.01); H01J 2237/31769 (2013.01);
Abstract

Lithographic apparatuses suitable for, and methodologies involving, complementary e-beam lithography (CEBL) are described. In an example, a column for an e-beam direct write lithography tool includes a first blanker aperture array (BAA) including a staggered array of openings having a pitch along an array direction. The array direction is orthogonal to a scan direction. Each opening has a first dimension in the array direction. The column also includes a second BAA including a staggered array of openings having the pitch along the array direction. Each opening has a second dimension in the array direction, the second dimension greater than the first dimension.

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