The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 22, 2019
Filed:
Dec. 16, 2013
Advanced Micro-fabrication Equipment, Inc. China, Shanghai, CN;
Tuqiang Ni, Pleasanton, CA (US);
Jinyuan Chen, Union City, CA (US);
Qing Qian, San Jose, CA (US);
Yuehong Fu, Fremont, CA (US);
Zhaoyang Xu, Shanghai, CN;
Xusheng Zhou, Shanghai, CN;
Ye Wang, Shanghai, CN;
ADVANCED MICRO-FABRICATION EQUIPMENT, INC. CHINA, Shangahi, CN;
Abstract
A plasma confinement apparatus, and method for confining a plasma are described and which includes, in one form of the invention, a plurality of electrically insulated components which are disposed in predetermined spaced relation, one relative to the others, and surrounding a processing region of a plasma processing apparatus, and wherein a plurality of passageways are defined between the respective insulated components; and at least one electrically conductive and grounded component forms an electrical field shielding for the processing region.