The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 15, 2019

Filed:

Jun. 30, 2017
Applicant:

Taiwan Semiconductor Manufacturing Company Limited, Hsinchu, TW;

Inventors:

Jaw-Juinn Horng, Hsinchu, TW;

Bei-Shing Lien, Taipei, TW;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/092 (2006.01); H01L 21/8238 (2006.01);
U.S. Cl.
CPC ...
H01L 27/092 (2013.01); H01L 21/823878 (2013.01);
Abstract

A semiconductor structure is disclosed that includes a p-channel metal-oxide semiconductor (PMOS) array having a first set of oxide diffusion layer (OD) structures, an n-channel metal-oxide semiconductor (NMOS) array having a second set of OD structures, and a dummy buffer zone surrounding the PMOS and NMOS arrays. The semiconductor structure has a uniform spacing between OD structures in the first and second sets of OD structures and between the PMOS and NMOS array, such that no dummy buffer zone is included between the PMOS array and the NMOS array.


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