The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 08, 2019
Filed:
Aug. 29, 2014
Asml Netherlands B.v., Veldhoven, NL;
Robert Douglas Watso, Delevan, NY (US);
Youri Johannes Laurentius Maria Van Dommelen, Ballston Lake, NY (US);
Johannes Henricus Wilhelmus Jacobs, Eindhoven, NL;
Hans Jansen, Eindhoven, NL;
Martinus Hendrikus Antonius Leenders, Rhoon, NL;
Jeroen Johannes Sophia Maria Mertens, Duizel, NL;
Peter Paul Steijaert, Eindhoven, NL;
Antonius Martinus Cornelis Petrus De Jong, Pijnacker, NL;
Jimmy Matheus Wilhelmus Van De Winkel, Kessel, NL;
Joao Paulo Da Paz Sena, Eindhoven, NL;
Maurice Martinus Johannes Van Der Lee, Eindhoven, NL;
Henricus Martinus Dorotheus Van Lier, Neer, NL;
Gheorghe Tanasa, Eindhoven, NL;
ASML NETHERLANDS B.V., Veldhoven, NL;
Abstract
A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile