The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 2019
Filed:
Nov. 30, 2017
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Shogo Tsukazawa, Iwate, JP;
Chihhsiang Hsiao, Iwate, JP;
Masafumi Ishida, Beaverton, OR (US);
Yutaka Takahashi, Iwate, JP;
Atsushi Endo, Yamanashi, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); B05D 1/00 (2006.01); H01L 21/687 (2006.01); H01L 21/3205 (2006.01); C23C 16/455 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02274 (2013.01); B05D 1/60 (2013.01); B05D 1/62 (2013.01); C23C 16/45536 (2013.01); H01L 21/0228 (2013.01); H01L 21/02315 (2013.01); H01L 21/02554 (2013.01); H01L 21/32056 (2013.01); H01L 21/68764 (2013.01);
Abstract
A protective film forming method is provided. In the method, an oxide film of either an organic metal compound or an organic metalloid compound is deposited on a flat surface region between adjacent recessed shapes formed in a surface of a substrate. Then, a lateral portion of the oxide film deposited on the flat surface region is removed by etching.