The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 01, 2019
Filed:
Jan. 21, 2016
Charged particle beam device, and method of manufacturing component for charged particle beam device
Hitachi High-technologies Corporation, Minato-ku, Tokyo, JP;
Takashi Ichimura, Tokyo, JP;
Hiroyuki Ito, Tokyo, JP;
Shinichi Kato, Tokyo, JP;
Hisaya Murakoshi, Tokyo, JP;
Tadashi Fujieda, Tokyo, JP;
Tatsuya Miyake, Tokyo, JP;
Takashi Naitou, Tokyo, JP;
Takuya Aoyagi, Tokyo, JP;
Kenji Tanimoto, Tokyo, JP;
Hitachi High-Technologies Corporation, Tokyo, JP;
Abstract
The purpose of the present invention is to provide a charged particle beam device that exhibits high performance due to the use of vanadium glass coatings, and to provide a method of manufacturing a component for a charged particle beam device. Specifically provided is a charged particle beam device using a vacuum component characterized by comprising a metal container, the interior space of which is evacuated to form a high vacuum, and coating layers formed on the surface on the interior space-side of the metal container, wherein the coating layers are vanadium-containing glass, which is to say an amorphous substance. Coating vanadium glass onto walls of a space where it is desirable to form a high vacuum, for example walls in the vicinity of an electron source, reduces gas discharge in the vicinity of the electron source, and the getter effect of the coating layer induces localized evacuation and enables the formation of an extremely high vacuum, even in spaces having a complex structure, without providing a large high-vacuum pump.