The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 2018
Filed:
Oct. 30, 2015
Applicant:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Inventor:
Shih-Wei Hung, Hsin-Chu, TW;
Assignee:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 21/66 (2006.01); G01K 13/00 (2006.01); H01L 21/324 (2006.01); G01J 5/04 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 22/12 (2013.01); G01J 5/04 (2013.01); G01K 13/00 (2013.01); H01L 21/3247 (2013.01); H01L 21/67115 (2013.01); H01L 21/67248 (2013.01); H01L 22/26 (2013.01);
Abstract
A substrate processing chamber, having a processing surface, includes a guide fixed in place relative to the substrate processing chamber and a movable pyrometer connected to the guide. The movable pyrometer is movable along a radial axis that extends approximately between a center of the processing surface and an outer surface of the processing surface. The movable pyrometer is operable to monitor temperatures inside the substrate processing chamber along the radial axis.