The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 25, 2018
Filed:
Mar. 31, 2015
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Toralf Gruner, Aalen-Hofen, DE;
Sascha Bleidistel, Aalen, DE;
Alexander Wolf, Oberkochen, DE;
Joachim Hartjes, Aalen, DE;
Markus Schwab, Aalen, DE;
Markus Hauf, Ulm, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
The invention relates to a projection exposure apparatus for semiconductor lithography, comprising an illumination system for illuminating a mask arranged on a movable mask stage, and comprising a projection lens for imaging the mask onto a semiconductor substrate, wherein at least one means is present for at least partly decoupling at least parts of the illumination system and/or of the projection lens from the influence of pressure fluctuations in the medium surrounding the projection lens or the illuminated system, the pressure fluctuations being attributed to movements of the mask stage during the operation of the apparatus.