The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 11, 2018
Filed:
Dec. 18, 2015
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Satoru Kobayashi, Santa Clara, CA (US);
Hideo Sugai, A'ichi, JP;
Soonam Park, Mountain View, CA (US);
Kartik Ramaswamy, San Jose, CA (US);
Dmitry Lubomirsky, Cupertino, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32192 (2013.01); H01J 37/3222 (2013.01); H01J 37/32302 (2013.01); H01J 37/32311 (2013.01);
Abstract
A plasma reactor for processing a workpiece has a microwave source with a digitally synthesized rotation frequency using direct digital up-conversion and a user interface for controlling the rotation frequency.
Kobayashi, Satoru. (2018). Plasma reactor having digital control over rotation frequency of a microwave field with direct up-conversion (U.S. Patent No. 10153133). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10153133
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile