The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 11, 2018

Filed:

Sep. 11, 2014
Applicant:

Koh Young Technology Inc., Seoul, KR;

Inventors:

Seungwon Jung, Seoul, KR;

Jongjin Choi, Gwangmyeong-si, KR;

Heewook You, Seoul, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01); G01N 21/88 (2006.01); G01N 21/956 (2006.01); G06T 5/00 (2006.01);
U.S. Cl.
CPC ...
G01N 21/8851 (2013.01); G01N 21/956 (2013.01); G01N 21/95607 (2013.01); G01N 21/95684 (2013.01); G06T 5/006 (2013.01); G01N 2021/8896 (2013.01); G01N 2021/95638 (2013.01); G01N 2201/121 (2013.01); G06T 2207/20076 (2013.01); G06T 2207/30141 (2013.01);
Abstract

The present invention relates to a method for generating a compensation matrix during a substrate inspection. The method comprises the steps of: selecting information of N(N≥2) feature objects which are randomly predetermined within a field of view (FOV) on a substrate; generating a first compensation matrix on the basis of information of the feature objects which are extracted on the substrate; comparing an offset value of each of all the feature objects with a predetermined reference value by applying all the feature objects within the FOV to the compensation matrix to count the number of the feature objects of which the offset value of the each of all the feature objects is less than the predetermined reference value; and repeatedly performing the above steps Ntimes (N≥1), and generating a second compensation matrix using information of the feature objects which have the offset value which is less than the predetermined reference value, in case the number of the counted feature objects is the maximum.


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