The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 27, 2018

Filed:

May. 10, 2017
Applicant:

Shinkawa Ltd., Tokyo, JP;

Inventors:

Kohei Seyama, Tokyo, JP;

Shoji Wada, Tokyo, JP;

Assignee:

SHINKAWA LTD., Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 3/00 (2006.01); B23K 3/08 (2006.01); B23K 101/42 (2006.01);
U.S. Cl.
CPC ...
B23K 3/082 (2013.01); B23K 2201/42 (2013.01);
Abstract

A flux reservoir apparatus () includes a stage () having a recessed portion () for reserving flux () therein and a flux pot () composed of an annular member having a through hole () through which the flux () flows, the flux pot arranged to move back and forth on the surface () of the stage () to feed the flux () into the recessed portion () and to smooth the surface of the flux (), in which the through hole () is an elongated hexagonal hole with a length greater than the width of the recessed portion () in the direction perpendicular to the back-and-forth direction, and in which the bottom surface of a flux pot main body () is a chevron surface. This reduces leakage of the flux () in the flux reservoir apparatus ().


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