The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 27, 2018

Filed:

Jan. 26, 2015
Applicant:

Micron Technology, Inc., Boise, ID (US);

Inventors:

Joseph Neil Greeley, Boise, ID (US);

Dan Millward, Boise, ID (US);

Wayne Huang, Boise, ID (US);

Assignee:

Micron Technology, Inc., Boise, ID (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B08B 3/00 (2006.01); B08B 3/10 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01); B08B 3/12 (2006.01);
U.S. Cl.
CPC ...
B08B 3/10 (2013.01); B08B 3/12 (2013.01); H01L 21/02041 (2013.01); H01L 21/02057 (2013.01); H01L 21/67057 (2013.01);
Abstract

Some embodiments include methods of removing particles from over surfaces of semiconductor substrates. Liquid may be flowed across the surfaces and the particles. While the liquid is flowing, electrophoresis and/or electroosmosis may be utilized to enhance transport of the particles from the surfaces and into the liquid. In some embodiments, temperature, pH and/or ionic strength within the liquid may be altered to assist in the removal of the particles from over the surfaces of the substrates.


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