The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 06, 2018

Filed:

Aug. 27, 2014
Applicant:

Renesas Electronics Corporation, Kawasaki-shi, JP;

Inventors:

Hirofumi Shinohara, Kawasaki, JP;

Hidekazu Oda, Kawasaki, JP;

Toshiaki Iwamatsu, Kawasaki, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/8234 (2006.01); H01L 21/8238 (2006.01); H01L 27/092 (2006.01); H01L 21/84 (2006.01); H01L 27/088 (2006.01); H01L 27/11 (2006.01); H01L 27/12 (2006.01);
U.S. Cl.
CPC ...
H01L 21/823814 (2013.01); H01L 21/823418 (2013.01); H01L 21/84 (2013.01); H01L 27/088 (2013.01); H01L 27/0922 (2013.01); H01L 27/1104 (2013.01); H01L 27/1203 (2013.01);
Abstract

To suppress performance degradation of a semiconductor device, when the width of a first active region having a first field effect transistor formed therein is smaller than the width of a second active region having a second field effect transistor formed therein, the height of a surface of a first raised source layer of the first field effect transistor is made larger than the height of a surface of a second raised source layer of the second field effect transistor. Moreover, the height of a first surface of a raised drain layer of the first field effect transistor is made larger than a surface of a second raised drain layer of the second field effect transistor.


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