The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 06, 2018

Filed:

Sep. 30, 2014
Applicants:

Carl Zeiss Microscopy Gmbh, Jena, DE;

Applied Materials Israel, Ltd., Rehovot, IL;

Inventors:

Stefan Schubert, Oberkochen, DE;

Thomas Kemen, Meppen, DE;

Rainer Knippelmeyer, Herrsching am Ammerse, DE;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/28 (2006.01); H01J 37/147 (2006.01);
U.S. Cl.
CPC ...
H01J 37/28 (2013.01); H01J 37/1472 (2013.01); H01J 2237/047 (2013.01);
Abstract

A method of operating a charged particle beam system, the method comprises extracting a particle beam from a source; performing a first accelerating of the particles of the beam; forming a plurality of particle beamlets from the beam after the performing of the first accelerating; performing a second accelerating of the particles of the beamlets; performing a first decelerating of the particles of the beamlets after the performing of the second accelerating; deflecting the beamlets in a direction oriented transverse to a direction of propagation of the particles of the beamlets after the performing of the first decelerating; performing a second decelerating of the particles of the beamlets after the deflecting of the beamlets; and allowing the particles of the beamlets to be incident on an object surface after the performing of the second decelerating.


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