The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 16, 2018
Filed:
Jul. 17, 2015
Applicant:
Cabot Microelectronics Corporation, Aurora, IL (US);
Inventors:
Assignee:
Cabot Microelectronics Corporation, Aurora, IL (US);
Primary Examiner:
Int. Cl.
CPC ...
C11D 7/32 (2006.01); C11D 11/00 (2006.01); C11D 7/36 (2006.01); C11D 7/26 (2006.01); H01L 21/02 (2006.01); H01L 21/321 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
C11D 11/0047 (2013.01); C11D 7/265 (2013.01); C11D 7/267 (2013.01); C11D 7/32 (2013.01); C11D 7/3209 (2013.01); C11D 7/3218 (2013.01); C11D 7/3245 (2013.01); C11D 7/3272 (2013.01); C11D 7/36 (2013.01); H01L 21/02074 (2013.01); H01L 21/3212 (2013.01); H01L 21/7684 (2013.01);
Abstract
The invention provides a composition for cleaning contaminants from semiconductor wafers following chemical-mechanical polishing. The cleaning composition contains a bulky protecting ligand, an organic amine, an organic inhibitor, and water. The invention also provides methods for using the cleaning composition.