The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 09, 2018
Filed:
Mar. 17, 2016
Applied Materials, Inc., Santa Clara, CA (US);
Jun Xue, San Jose, CA (US);
Ludovic Godet, Sunnyvale, CA (US);
Srinivas Nemani, Sunnyvale, CA (US);
Michael W. Stowell, Loveland, CO (US);
Qiwei Liang, Fremont, CA (US);
Douglas A. Buchberger, Livermore, CA (US);
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Abstract
Methods of processing a substrate are provided herein. In some embodiments, a method of processing a substrate disposed in a processing chamber includes: (a) depositing a layer of material on a substrate by exposing the substrate to a first reactive species generated from a remote plasma source and to a first precursor, wherein the first reactive species reacts with the first precursor; and (b) treating all, or substantially all, of the deposited layer of material by exposing the substrate to a plasma generated within the processing chamber from a second plasma source; wherein at least one of the remote plasma source or the second plasma source is pulsed to control periods of depositing and periods of treating.