The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 09, 2018
Filed:
Jun. 01, 2015
Asml Netherlands B.v., Veldhoven, NL;
Giovanni Luca Gattobigio, Eindhoven, NL;
Erik Henricus Egidius Catharina Eummelen, Eindhoven, NL;
Ruud Olieslagers, Eindhoven, NL;
Gerben Pieterse, Eindhoven, NL;
Cornelius Maria Rops, Waalre, NL;
Laurentius Johannes Adrianus Van Bokhoven, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus including a projection system configured to project a patterned radiation beam onto a substrate and a fluid confinement structure configured to confine immersion fluid in a localized region between a final element of the projection system and a surface of the substrate. The lithographic apparatus is configured to have a space bounded on one side by a surface of the projection system and/or a component of the lithographic apparatus at least partially surrounding the final element of the projection system, and on the other side by a surface of the fluid confinement structure. The apparatus is configured to increase the humidity of the gas within the space.