The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 09, 2018
Filed:
Apr. 26, 2017
Applicant:
Nuflare Technology, Inc., Yokohama-shi, JP;
Inventor:
Nobutaka Kikuiri, Koganei, JP;
Assignee:
NuFlare Technology, Inc., Yokohama-shi, JP;
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/00 (2006.01); G01N 23/2251 (2018.01); G01N 23/2204 (2018.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
G01N 23/2251 (2013.01); G01N 23/2204 (2013.01); H01L 22/00 (2013.01);
Abstract
A pattern inspection apparatus includes a column to scan a substrate on which a pattern is formed, using multi-beams composed of a plurality of electron beams, a first stage to be able to move up to a first stroke by which an entire surface of an inspection region of the substrate can be irradiated with the multi-beams, a second stage, arranged on the first stage, to be able to move up to a second stroke sufficiently shorter than the first stroke and to place the substrate thereon, and a detector to detect secondary electrons emitted from the substrate because the substrate is irradiated with the multi-beams.