The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 02, 2018

Filed:

Nov. 28, 2012
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;

Inventors:

Jiann Lih Wu, Hsinchu, TW;

Jeng-Jyi Hwang, Chu-Tong Town, TW;

Soon-Kang Huang, Hsinchu, TW;

Chi-Ming Yang, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B24B 49/12 (2006.01); H01L 21/66 (2006.01); B24B 37/013 (2012.01); B24B 37/04 (2012.01);
U.S. Cl.
CPC ...
H01L 22/12 (2013.01); B24B 37/013 (2013.01); B24B 37/04 (2013.01); B24B 49/12 (2013.01); H01L 22/26 (2013.01); H01L 2924/0002 (2013.01);
Abstract

A wafer polishing system including a platen configured to rotate in a first direction, and a polishing head configured to hold a wafer, the polishing head configured to rotate in a second direction. The wafer polishing system further includes an optical sensing system configured to detect a thickness of the wafer at a first location on the platen and a second location on the platen. A first distance from a center of the platen to the first location is different than a second distance from the center of the platen to the second location.


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