The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 02, 2018
Filed:
Sep. 02, 2016
Applicant:
Kla-tencor Corporation, Milpitas, CA (US);
Inventor:
Shifang Li, Pleasanton, CA (US);
Assignee:
KLA-Tencor Corporation, Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/24 (2006.01); G01B 11/06 (2006.01); G02B 1/11 (2015.01); G02B 5/08 (2006.01); G02B 27/00 (2006.01); G02B 27/09 (2006.01); G02B 27/14 (2006.01); G02B 7/38 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G01B 11/0608 (2013.01); G02B 1/11 (2013.01); G02B 5/0808 (2013.01); G02B 7/38 (2013.01); G02B 27/0025 (2013.01); G02B 27/09 (2013.01); G02B 27/0911 (2013.01); G02B 27/14 (2013.01); G03F 7/70 (2013.01); G01B 2210/56 (2013.01);
Abstract
A system that can be used for semiconductor height inspection and metrology includes a complementary plate that is used with a beam splitter to create desired astigmatism and to remove chromatic aberration. Simultaneous optimization of lateral resolution and sensitivity can be enabled. The complementary plate can be made of the same material and have the same thickness as the beam splitter.