The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 2018
Filed:
Apr. 10, 2017
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Asml Netherlands B.v., Veldhoven, NL;
Dirk Heinrich Ehm, Beckingen, DE;
Stefan-Wolfgang Schmidt, Mettlach, DE;
Edgar Osorio, Veldhoven, NL;
Edwin Te Sligte, Eindhoven, NL;
Mark Zellenrath, Veldhoven, NL;
Hella Logtenberg, Eindhoven, NL;
Carl Zeiss SMT GmbH, Oberkochen, DE;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An EUV lithography system () includes: at least one optical element () having an optical surface () arranged in a vacuum environment () of the EUV lithography system (), and a feed device () for feeding hydrogen into the vacuum environment (), in which at least one silicon-containing surface () is arranged. The feed device () additionally feeds an oxygen-containing gas into the vacuum environment () and has a metering device () that sets an oxygen partial pressure (p) at the at least one silicon-containing surface () and/or at the optical surface ().