The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 11, 2018
Filed:
Dec. 09, 2015
Applicant:
Air Products and Chemicals, Inc., Allentown, PA (US);
Inventors:
Rajiv Krishan Agarwal, Malvern, PA (US);
Mark Richard Brown, Schnecksville, PA (US);
Aiping Wu, Macungie, PA (US);
David Barry Rennie, Bethlehem, PA (US);
Yi-Chia Lee, Chupei, TW;
Gene Everad Parris, Coopersburg, PA (US);
Assignee:
VERSUM MATERIALS US, LLC, Tempe, AZ (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C11D 7/32 (2006.01); G03F 7/42 (2006.01); C11D 11/00 (2006.01); C11D 7/26 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
G03F 7/425 (2013.01); C11D 7/261 (2013.01); C11D 7/265 (2013.01); C11D 7/267 (2013.01); C11D 7/3209 (2013.01); C11D 7/3218 (2013.01); C11D 7/3281 (2013.01); C11D 11/0047 (2013.01); G03F 7/423 (2013.01); G03F 7/426 (2013.01); H01L 21/02057 (2013.01); H01L 21/02334 (2013.01);
Abstract
A photoresist or semiconductor manufacturing residue stripping and cleaning composition comprising water, one or more alkaline compounds, one or more corrosion inhibitors, and one or more oxidized products of one or more antioxidants, the method of making the composition and the method of using the composition.