The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 04, 2018

Filed:

May. 22, 2017
Applicant:

Texas Instruments Incorporated, Dallas, TX (US);

Inventors:

Furen Lin, Chengdu, CN;

Frank Baiocchi, Allentown, PA (US);

Haian Lin, Bethlehem, PA (US);

Yunlong Liu, Chengdu, CN;

Lark Liu, Chengdu, CN;

Wei Song, Chengdu, CN;

ZiQiang Zhao, Chengdu, CN;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/417 (2006.01); H01L 29/06 (2006.01); H01L 29/40 (2006.01); H01L 29/78 (2006.01); H01L 29/66 (2006.01); H01L 27/088 (2006.01);
U.S. Cl.
CPC ...
H01L 29/41741 (2013.01); H01L 27/088 (2013.01); H01L 29/0696 (2013.01); H01L 29/402 (2013.01); H01L 29/41775 (2013.01); H01L 29/66689 (2013.01); H01L 29/7816 (2013.01); H01L 29/7834 (2013.01);
Abstract

A power MOSFET IC device including an array of MOSFET cells formed in a semiconductor substrate. The array of MOSFET cells comprises an interior region of interior MOSFET cells and an outer edge region of peripheral MOSFET cells, each interior MOSFET cell of the interior region of the array comprising a pair of interior MOSFET devices coupled to each other at a common drain contact. In an example embodiment, each interior MOSFET device includes a source contact (SCT) trench extended into a substrate contact region of the semiconductor substrate. The SCT trench is provided with a length less than a linear portion of a polysilicon gate of the interior MOSFET device, wherein the SCT trench is aligned to the polysilicon gate having a curvilinear layout geometry.


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