The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 04, 2018

Filed:

Mar. 10, 2015
Applicant:

Nova Measuring Instruments Ltd., Rehovot, IL;

Inventor:

Igor Turovets, Moshav Givat Yarim, IL;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/02 (2006.01); G01B 11/27 (2006.01); H01L 21/66 (2006.01); G01N 21/47 (2006.01); G01N 21/956 (2006.01); G01N 21/95 (2006.01); H01L 21/033 (2006.01);
U.S. Cl.
CPC ...
G01B 11/272 (2013.01); G01N 21/47 (2013.01); G01N 21/4788 (2013.01); G01N 21/9501 (2013.01); G01N 21/95607 (2013.01); H01L 21/0337 (2013.01); H01L 22/30 (2013.01); G01B 2210/56 (2013.01); G01N 2021/95615 (2013.01); G01N 2201/12753 (2013.01);
Abstract

An article is presented configured for controlling a multiple patterning process, such as a spacer self-aligned multiple patterning, to produce a target pattern. The article comprises a test site carrying a test structure comprising at least one pair of gratings, wherein first and second gratings of the pair are in the form of first and second patterns of alternating features and spaces and differ from the target pattern by respectively different first and second values which are selected to provide together a total difference such that a differential optical response from the test structure is indicative of a pitch walking effect.


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