The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 28, 2018
Filed:
Feb. 15, 2017
Carl Zeiss Smt Gmbh, Oberkochen, DE;
Dirk Heinrich Ehm, Beckingen, DE;
Moritz Becker, Stuttgart, DE;
Irene Ament, Aalen, DE;
Gisela Von Blanckenhagen, Aalen, DE;
Joern Weber, Aalen, DE;
Carl Zeiss SMT GmbH, Oberkochen, DE;
Abstract
A reflective optical element, in particular for a microlithographic projection exposure apparatus has a substrate (), a reflection layer system () and a defect structure () of channel-shaped defects () which extend inward from the optical effective surface (), or from an interface oriented toward the substrate as far as the reflection layer system, and permit egress of hydrogen from the reflection layer system. The channel-shaped defects () increase a diffusion coefficient that is characteristic for the egress of the hydrogen from the reflection layer system () by at least 20%, in comparison to a similar layer construction without these channel-shaped defects.