The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 21, 2018

Filed:

Sep. 30, 2015
Applicant:

Lam Research Ag, Villach, AT;

Inventors:

Ulrich Tschinderle, Feistritz/Gail, AT;

Andreas Gleissner, Radenthein, AT;

Thomas Wirnsberger, Seeboden, AT;

Rainer Obweger, Lind im Drautal, AT;

Assignee:

LAM RESEARCH AG, Villach, AT;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/687 (2006.01);
U.S. Cl.
CPC ...
H01L 21/68785 (2013.01); H01L 21/6708 (2013.01); H01L 21/6719 (2013.01); H01L 21/67023 (2013.01); H01L 21/67051 (2013.01); Y10T 279/3493 (2015.01);
Abstract

A device for processing wafer-shaped articles comprises a closed process chamber. The closed process chamber comprises a housing providing a gas-tight enclosure, a rotary chuck located within the closed process chamber and adapted to hold a wafer shaped article thereon, and an interior cover disposed within said closed process chamber. The interior cover is movable between a first position in which the rotary chuck communicates with an outer wall of the closed process chamber, and a second position in which the interior cover seals against an inner surface of the closed process chamber adjacent the rotary chuck to define a gas-tight inner process chamber.


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