The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 14, 2018
Filed:
Oct. 21, 2016
Applicant:
Fei Company, Hillsboro, OR (US);
Inventors:
Tameyasu Anayama, Cupertino, CA (US);
John Muzzio, Fremont, CA (US);
Herve Deslandes, Sunnyvale, CA (US);
Assignee:
FEI Company, Hillsboro, OR (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/56 (2006.01); H01L 21/66 (2006.01); G02B 21/00 (2006.01); G02B 21/36 (2006.01);
U.S. Cl.
CPC ...
H01L 22/20 (2013.01); G02B 21/006 (2013.01); G02B 21/0016 (2013.01); G02B 21/365 (2013.01); H01L 21/56 (2013.01);
Abstract
An IR camera is used to image an IC to identify hot spots. The objective of the IR camera is removed and laser optics are inserted into the optical axis of the system. A laser is then used to ablate the encapsulation in a defined area around the optical axis. The IR camera operates in a lock-in mode to obtain phase information of the IR signal from the IC. The phase information is used to obtain a depth estimate of the defect. Predetermined etch rates are then used in conjunction with the depth estimate to generate a timed end-point for the laser ablation.