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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10043708 B1

PDFFull Text
Date of Patent:
Aug. 07, 2018

Filed:

Nov. 09, 2016

Structure and method for capping cobalt contacts

Applicant:

Globalfoundries Inc., Grand Cayman, KY;

Inventors:

Viraj Sardesai, Malta, NY (US);

Suraj K. Patil, Ballston Lake, NY (US);

Scott Beasor, Greenwich, NY (US);

Vimal Kumar Kamineni, Mechanicville, NY (US);

Assignee:

GLOBALFOUNDRIES INC., Grand Cayman, KY;

Attorney:

Scully, Scott, Murphy & Presser PC

Primary Examiner:

Marc Armand

Assistant Examiner:

Sarah Salerno

Int. Cl.
CPC ...
H01L 29/40 (2006.01); H01L 21/768 (2006.01); H01L 23/522 (2006.01); H01L 23/532 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76849 (2013.01); H01L 21/76802 (2013.01); H01L 21/76843 (2013.01); H01L 21/76877 (2013.01); H01L 21/76886 (2013.01); H01L 23/5226 (2013.01); H01L 23/53209 (2013.01);
Abstract

A process for forming a conductive structure includes the formation of a self-aligned silicide cap over a cobalt-based contact. The silicide cap is formed in situ by the deposition of a thin silicon layer over exposed portions of a cobalt contact, followed by heat treatment to react the deposited silicon with the cobalt and form cobalt silicide, which is an effective barrier to cobalt migration and oxidation.

Find Patent Forward Citations

Sardesai, Viraj. (2018). Structure and method for capping cobalt contacts (U.S. Patent No. 10043708). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10043708

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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