The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 2018
Filed:
Sep. 01, 2016
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventors:
Richika Kato, Albany, NY (US);
Ryu Nakano, Boise, ID (US);
Assignee:
ASM IP Holding B.V., Almere, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C23C 16/34 (2006.01); C23C 16/40 (2006.01); C23C 16/455 (2006.01); H01L 21/225 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0228 (2013.01); C23C 16/34 (2013.01); C23C 16/401 (2013.01); C23C 16/45536 (2013.01); H01L 21/022 (2013.01); H01L 21/0217 (2013.01); H01L 21/02129 (2013.01); H01L 21/02164 (2013.01); H01L 21/02274 (2013.01); H01L 21/02359 (2013.01); H01L 21/02362 (2013.01); H01L 21/2254 (2013.01);
Abstract
A method for protecting a layer includes: providing a substrate having a target layer; depositing a protective layer on the target layer, which protective layer contacts and covers the target layer and is constituted by a hydrocarbon-based layer; and depositing an oxide layer on the protective layer so that the protective layer in contact with the oxide layer is oxidized. The hydrocarbon-based layer is formed by plasma-enhanced atomic layer deposition (PEALD) using an alkylaminosilane precursor and a noble gas without a reactant.
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