The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 07, 2018

Filed:

Jul. 18, 2017
Applicant:

Nuflare Technology, Inc., Yokohama-shi, JP;

Inventors:

Masataka Shiratsuchi, Kawasaki, JP;

Chosaku Noda, Yokohama, JP;

Riki Ogawa, Kawasaki, JP;

Assignee:

NuFlare Technology, Inc., Yokohama-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 23/22 (2018.01); G01N 23/2251 (2018.01); H01J 37/147 (2006.01); H01J 37/20 (2006.01); H01J 37/22 (2006.01);
U.S. Cl.
CPC ...
G01N 23/2251 (2013.01); H01J 37/1474 (2013.01); H01J 37/20 (2013.01); H01J 37/22 (2013.01); G01N 2223/3301 (2013.01); G01N 2223/3307 (2013.01); G01N 2223/426 (2013.01); G01N 2223/6116 (2013.01);
Abstract

A charged particle beam inspection apparatus includes a first deflector to deflect N×N' multiple beams collectively to N×N′ small regions having a size p/M in the first direction and arrayed at the pitch p in the first direction, perform tracking deflection, and re-deflect the multiple beams collectively to next N×N′ small regions away from the N×N′ small regions by N small regions in the first direction, by the stage completes a movement of a distance of N/M×p so as to reset the tracking deflection; and a second deflector to deflect the multiple beams collectively to scan the N×N′ small regions concerned while the tracking deflection is performed.


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