The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 17, 2018
Filed:
Feb. 17, 2015
Applicants:
Tokyo Electron Limited, Tokyo, JP;
Osaka University, Osaka, JP;
Inventors:
Assignees:
TOKYO ELECTRON LIMITED, Tokyo, JP;
OSAKA UNIVERSITY, Osaka, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/039 (2006.01); G03F 7/32 (2006.01); C07C 381/12 (2006.01); C07C 309/07 (2006.01); C07C 303/32 (2006.01); H01L 21/027 (2006.01); C08F 220/14 (2006.01); C08F 220/22 (2006.01); C08F 220/38 (2006.01); C08F 220/28 (2006.01); G03F 7/38 (2006.01); G03F 7/038 (2006.01); G03F 7/20 (2006.01); G03F 1/20 (2012.01); G03F 1/24 (2012.01); G03F 1/26 (2012.01); G03F 7/16 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0397 (2013.01); C07C 303/32 (2013.01); C07C 309/07 (2013.01); C07C 381/12 (2013.01); C08F 220/14 (2013.01); C08F 220/22 (2013.01); C08F 220/28 (2013.01); C08F 220/38 (2013.01); G03F 1/20 (2013.01); G03F 1/24 (2013.01); G03F 1/26 (2013.01); G03F 7/0045 (2013.01); G03F 7/0382 (2013.01); G03F 7/16 (2013.01); G03F 7/2002 (2013.01); G03F 7/2022 (2013.01); G03F 7/2041 (2013.01); G03F 7/32 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01); H01L 21/0274 (2013.01);
Abstract
A photosensitization chemical-amplification type resist material according to the present invention is used for a two-stage exposure lithography process, and contains (1) a developable base component and (2) a component generating a photosensitizer and an acid through exposure. Among three components consisting of (a) an acid-photosensitizer generator, (b) a photosensitizer precursor, and (c) a photoacid generator, the above component contains only the component (a), any two components, or all of the components (a) to (c).