The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 17, 2018

Filed:

Nov. 07, 2014
Applicant:

Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;

Inventors:

Chi-Ming Tsai, Taipei, TW;

Chih-Chiang Tu, Tauyen, TW;

Wen-Hao Cheng, Hsinchu, TW;

Ru-Gun Liu, Zhubei, TW;

Shuo-Yen Chou, Ji-an Shiang, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G03F 1/36 (2012.01); G03F 1/78 (2012.01);
U.S. Cl.
CPC ...
G03F 1/36 (2013.01); G03F 1/78 (2013.01); G06F 17/5081 (2013.01);
Abstract

A system and method that includes receiving a layout of an integrated circuit (IC) device. A template library is provided having a plurality of parameterized shape elements. A curvilinear feature of layout is classified by selecting at least one of the parameterized shape elements that defines the curvilinear feature. A template index is associated with the layout is formed that includes the selected parameterized shape element. The template index and the layout can be delivered to a mask writer, which uses the template index and the layout to fabricate a pattern on a photomask.


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