logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10020172 B1

PDFFull Text
Date of Patent:
Jul. 10, 2018

Filed:

May. 26, 2015

Plasma processing apparatus, plasma processing method and storage medium for storing program for executing the method

Applicant:

Tokyo Electron Limited, Tokyo, JP;

Inventors:

Mitsunori Ohata, Nirasaki, JP;

Hidetoshi Kimura, Nirasaki, JP;

Kiyoshi Maeda, Miyagi, JP;

Jun Hirose, Miyagi, JP;

Tsuyoshi Hida, Nirasaki, JP;

Assignee:

TOKYO ELECTRON LIMITED, Tokyo, JP;

Attorney:

Pearne & Gordon LLP

Primary Examiner:

Sylvia MacArthur

Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01); C23C 16/52 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32642 (2013.01); C23C 16/52 (2013.01); H01J 37/32091 (2013.01); H01L 21/67069 (2013.01); H01L 21/68735 (2013.01);
Abstract

There is provided a plasma processing apparatus including a susceptor, having a substrate mounting portion for mounting thereon a substrate; a focus ring including an outer ring and an inner ring; a dielectric ring; a dielectric constant varying device for varying a dielectric constant of the dielectric ring; a grounding body positioned at an outside of the dielectric ring with a gap from a bottom surface of the focus ring; and a controller for controlling a top surface electric potential of the focus ring by controlling a current flowing from the susceptor to the substrate.

Find Patent Forward Citations

Ohata, Mitsunori. (2018). Plasma processing apparatus, plasma processing method and storage medium for storing program for executing the method (U.S. Patent No. 10020172). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10020172

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…