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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 10018924 B1

PDFFull Text
Date of Patent:
Jul. 10, 2018

Filed:

Feb. 03, 2016

Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder

Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Raymond Wilhelmus Louis Lafarre, Helmond, NL;

Nicolaas Ten Kate, Almkerk, NL;

Nina Vladimirovna Dziomkina, Eindhoven, NL;

Yogesh Pramod Karade, Eindhoven, NL;

Siegfried Alexander Tromp, Papendrecht, NL;

Jacobus Josephus Leijssen, Waalre, NL;

Elisabeth Corinne Rodenburg, Heeze, NL;

Maurice Wilhelmus Leonardus Hendricus Feijts, Beek, NL;

Hendrik Huisman, Tilburg, NL;

Assignee:

ASML NETHERLANDS B.V., Veldhoven, NL;

Attorney:

Pillsbury Winthrop Shaw Pittman, LLP

Primary Examiner:

Deoram Persaud

Int. Cl.
CPC ...
G03B 27/58 (2006.01); G03F 7/20 (2006.01); G01J 5/20 (2006.01); G01J 5/02 (2006.01); B05D 3/02 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70716 (2013.01); B05D 3/02 (2013.01); G01J 5/0285 (2013.01); G01J 5/20 (2013.01); G03F 7/70341 (2013.01); G03F 7/70708 (2013.01);
Abstract

A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of a thin film stack forming an electronic component. The thin film stack comprises an (optional) isolation layer, a metal layer forming an electrode, a sensor, a heater, a transistor or a logic device, and a top isolation layer.

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Lafarre, Raymond Wilhelmus Louis. (2018). Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder (U.S. Patent No. 10018924). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/10018924

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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